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Taisei Giken`s
particle traps remove particulate by-products from the exhaust effluents
generated by semi-conductor TFT LCD manufacturing processes, ion implantation, etching, CVD, etc.
Taisei Traps can completely shut out fine sub-micron particulate with the coil
swirling Element and the high functional magnet Element. These devices cause
almost no pressure loss at the Element and can be installed at either the fore
line or the exhaust line of the vacuum pump. |
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| What is the TRAPPACK? |
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| The TRAPPACK utilizes electrostatic adsorption
type Elements (TRAPPACK Element), swirling adsorption type Elements (Coil
Element), or the combination type which uses both electrostatic and swirling
adsorption (Combination Element). The electrostatic and swirling Elements are
effective in different situations against different powders. The Combination
Type Element is capable of handling both situations and is able to completely
shut out all fine sub-micron powder. |
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System Construction (Vacuum Pump Fore Line) |
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Benefits |
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Maintains clean exhaust piping |
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Reduces valve maintenance frequency |
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Reduces problems with the vacuum
pump |
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Raises productivity |
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Reduces maintenance frequency on fore line |
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Structure |
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| System Construction (Exhaust line of
vacuum pump) |
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Benefits |
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Maintains clean exhaust line |
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Reduces V/P problems |
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Mitigates exhausted gas scrubber load |
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Raises productivity |
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Reduces maintenance frequency on exhaust line |
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Structure |
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